Hydrofluoric Acid (English: Hydrofluoric Acid) is an aqueous solution of hydrogen fluoride gas, clear, colourless, fuming corrosive liquid with a strong irritating odour. Melting point -83.3℃, boiling point 19.54℃, flash point 112.2℃, density 1.15g/cm³. Soluble in water, ethanol, slightly soluble in ether
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Hydrofluoric acid (HF) is a highly corrosive and reactive acid with a wide range of applications across various industries. As a key chemical in both inorganic and organic processes, it is especially valued for its ability to dissolve oxides and react with silicates and metals. Foshan Brilliance Chemical Co., Ltd. supplies high-purity hydrofluoric acid suitable for industrial-scale applications, including metal treatment, glass processing, semiconductor manufacturing, and chemical synthesis.
Hydrofluoric acid plays a crucial role in the purification of metals, particularly aluminum and uranium. Its ability to dissolve surface oxides makes it indispensable in refining processes, ensuring high-purity metal output.
HF is widely used for etching glass, enabling the creation of intricate patterns, characters, and measurement scales on glass surfaces. This application is common in decorative glass manufacturing, laboratory glassware, and instrumentation panels.
In the semiconductor sector, hydrofluoric acid is used to remove native oxides from the surface of silicon wafers. Its selectivity and effectiveness make it essential in microelectronics manufacturing and integrated circuit production.
HF serves as a catalyst in the alkylation process in petroleum refineries. It facilitates the alkylation of isobutane with n-butene to produce high-octane gasoline components, making it a critical chemical in fuel production.
Hydrofluoric acid is used in the “acid dipping” process to remove oxygen-containing impurities and oxide films from the surface of stainless steel. This ensures improved cleanliness, corrosion resistance, and bonding in further processing steps.
Hydrofluoric acid is a foundational material in the production of fluorine-containing compounds such as:
* Teflon (Polytetrafluoroethylene) – used in non-stick coatings, insulation, and gaskets
* Freon (Chlorofluorocarbons) – used as refrigerants (in regulated or phased-out applications)
These compounds are vital in the chemical, aerospace, and electronics industries.
Hydrofluoric acid is also used to remove glass coatings on microfilaments, such as glass-coated copper microfilaments manufactured by melt spinning. For glass layers around 10 μm thick, hydrofluoric acid removes the coating in approximately 150 seconds at room temperature.
In contrast, molten sodium hydroxide achieves the same in about 10 seconds, but each method has implications for corrosion behavior and safety. The structure and composition of the glass coating play a major role in its resistance to chemical attack. Research and testing show that HF corrosion behavior helps assess the durability and performance of these microfilaments under extreme chemical environments.
Hydrofluoric acid's action on glass and metal surfaces involves a complex mechanism of ion exchange and oxide dissolution. Foshan Brilliance Chemical Co., Ltd. has conducted and supported studies into the corrosion resistance of glass-coated copper microfilaments in both HF and molten alkali environments. Understanding these mechanisms is vital for high-precision industries where coating integrity and chemical compatibility are critical.
As a trusted supplier in the chemical industry, Foshan Brilliance Chemical Co., Ltd. ensures:
* Consistent high-purity hydrofluoric acid suitable for demanding industrial processes
* Stable supply and competitive pricing for bulk orders
* Customized packaging and logistics solutions for international markets
* Technical support and documentation for safety, handling, and regulatory compliance
Due to its high toxicity and corrosiveness, hydrofluoric acid requires special handling procedures. Proper protective equipment, training, and emergency protocols must be in place during use, storage, and transportation.
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